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#3단계의 변경 사항

Andrew Optimus Goldheart- 에 의해 수정

편집 승인됨 완료자 Andrew Optimus Goldheart

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변경 사항이 없습니다

단계 라인

-[* black] Our Development team member sets up the parameters to begin the removal of the dielectrics on an advanced node chip like the A6 where we may have up to 9 Cu and 1 Al layers plus polysilicon and substrate.
-[* black] Recently Chipworks just completed an addition to their delayering lab. Adding several more wet benches, fume hoods and polishing stations
+[* black] A member of the Chipworks development team sets up parameters on the IBE for the removal of the dielectrics on an advanced node chip (like the A6) where we may have up to 9 Copper and 1 Aluminum layer plus polysilicon and substrate layers.
+[* black] Recently Chipworks completed an addition to their delayering lab, adding several more wet benches, fume hoods, and polishing stations