주요 콘텐츠로 건너뛰기

#3단계의 변경 사항

David Hodson- 에 의해 수정

편집 승인됨 완료자 David Hodson

이전
이후
변경 사항이 없습니다

단계 라인

-[* black] A member of the Chipworks development team sets up parameters on the IBE for the removal of the dielectrics on an advanced node chip (like the A6) where we may have up to 9 Copper and 1 Aluminum layer plus polysilicon and substrate layers.
-[* black] Recently Chipworks completed an addition to their delayering lab, adding several more wet benches, fume hoods, and polishing stations
+[* black] A member of the Chipworks development team sets up parameters on the IBE for the removal of the dielectrics on an advanced node chip (like the A6) where there may be up to 9 copper and 1 aluminum layer plus polysilicon and substrate layers.
+[* black] Recently, Chipworks completed an addition to their delayering lab, adding several more wet benches, fume hoods, and polishing stations